
Semiconductor Devices - Micro-electromechanical Devices - Part 2: Tensile Testing Methods Of Thin Film Materials
出版:Association Francaise de Normalisation

专家解读视频
Specifies the method for tensile testing of thin film materials with length and width under 1 mm and thickness under 10[mu]m, which are main structural materials for micro-electromechanical systems (MEMS), micromachines and similar devices.
Indice de classement: C96-050-2 PR NF EN 62047-2 June 2005. (06/2005)
I.S. EN 62047-2:2006 - Identical
IEC 62047-2 Ed. 1.0 - Identical
BS EN 62047-2:2006 - Identical
DIN EN 62047-2 (2007-02) - Identical
NBN EN 62047-2:2007 - Identical