SEMI MF1771:2016(R2021)现行
Test Method for Evaluating Gate Oxide Integrity by Voltage Ramp Technique
出版：Semiconductor Equipment & Materials Institute
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基本信息
标准编号： SEMI MF1771:2016(R2021)
标准类别：Test Method
出版单位：Semiconductor Equipment & Materials Institute
标准页数：0
标准简介
The technique outlined in this Test Method is meant to standardize the procedure, analysis and reporting of oxide integrity data via the voltage ramp technique among interested parties.
本标准替代的旧标准
