
Semiconductor Devices - Micro-electromechanical Devices - Part 2: Tensile Testing Method Of Thin Film Materials
出版:German Institute for Standardisation (Deutsches Institut für Normung)

专家解读视频
Specifies the method for tensile testing of thin film materials with length and width under 1 mm and thickness under 10[mu]m, which are main structural materials for micro-electromechanical systems (MEMS), micromachines and similar devices.
Supersedes DIN IEC 62047-2. (02/2007)
I.S. EN 62047-2:2006 - Identical
NF EN 62047-2:2006 - Identical
BS EN 62047-2:2006 - Identical
NBN EN 62047-2:2007 - Identical
IEC 62047-2 Ed. 1.0 - Identical