I.S. EN 62047-16:2015现行
Semiconductor Devices - Micro-electromechanical Devices Part 16: Test Methods for Determining Residual Stresses of Mems Films - Wafer Curvature and Cantilever Beam Deflection Methods
出版：National Standards Authority of Ireland
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基本信息
标准编号： I.S. EN 62047-16:2015
发布时间：2015/7/28 0:00:00
标准类别：Standard
出版单位：National Standards Authority of Ireland
标准页数：34
标准简介
Defines the test methods to measure the residual stresses of films with thickness in the range of 0,01 [mu]m to 10 [mu]m in MEMS structures fabricated by wafer curvature or cantilever beam deflection methods.
等同采用的国际标准
EN 62047-16:2015 - Identical
